发明名称 |
SYSTEM AND METHOD FOR MANUFACTURING POLYCRYSTAL SILICON |
摘要 |
A polycrystal silicon manufacturing apparatus and a method of manufacturing polycrystal silicon using the same are disclosed. The polycrystal silicon manufacturing apparatus includes a reaction pipe comprising silicon particles provided therein; a flowing-gas supply unit configured to supply flowing gas to the silicon particles provided in the reaction pipe; and a first pressure sensor configured to measure a pressure of a first area in the reaction pipe; a second pressure sensor configured to measure a pressure of a second area in the reaction pipe; and a particle outlet configured to exhaust polycrystal silicon formed in the reaction pipe outside, when a difference between a first pressure measured by the first pressure sensor and a second pressure measured by the second pressure sensor is a reference pressure value or more. |
申请公布号 |
US2012269712(A1) |
申请公布日期 |
2012.10.25 |
申请号 |
US201113247587 |
申请日期 |
2011.09.28 |
申请人 |
JUNG YUNSUB;KIM KEUNHO;YOON YEOKYUN;KIM TED;SILICONVALUE LLC. |
发明人 |
JUNG YUNSUB;KIM KEUNHO;YOON YEOKYUN;KIM TED |
分类号 |
C01B33/021;B01J19/00 |
主分类号 |
C01B33/021 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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