METHOD FOR FORMING AMORPHOUS CARBON NITRIDE FILM, AMORPHOUS CARBON NITRIDE FILM, MULTILAYER RESIST FILM, METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE, AND STORAGE MEDIUM IN WHICH CONTROL PROGRAM IS STORED,申请号KR20117000272-传众专利搜索

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发明名称	METHOD FOR FORMING AMORPHOUS CARBON NITRIDE FILM, AMORPHOUS CARBON NITRIDE FILM, MULTILAYER RESIST FILM, METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE, AND STORAGE MEDIUM IN WHICH CONTROL PROGRAM IS STORED
摘要
申请公布号	KR101194192(B1)	申请公布日期	2012.10.25
申请号	KR20117000272	申请日期	2009.06.30
申请人		发明人
分类号	H01L21/205;C23C16/26;C23C16/34;H01L21/027	主分类号	H01L21/205
代理机构		代理人
主权项
地址

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