| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide an imprint method and device, wherein peeling is enabled with less peel force according to a form of a material layer to be transferred, thereby preventing the occurrence of the disadvantage that resin to be transferred attaches to a mold. <P>SOLUTION: The imprint method includes: a contact area recognition operation where the contact area of the mold and the transferred material layer is recognized and determined at the process of separating off the mold from the transferred material layer; a gravity point determination operation where a gravity point of a shape of the recognized contact area based on the shape thereof; and a peel off operation where a force point from which a peel off force is added toward the mold or a substrate for imprint is decided based on the obtained gravity point, and a force for peeling off is acted on the force point. <P>COPYRIGHT: (C)2013,JPO&INPIT |
