Adaptive mirror, particularly for microlithographic projection exposure apparatus, for certain wavelengths, has substrate, electrical leads, electrically insulating insulation layer, and array of control electrodes

摘要

The adaptive mirror (10) has a substrate (12), electrical leads, an electrically insulating insulation layer (22), an array of control electrodes (26) electrically isolated from one another, a piezoelectric layer (28), a counter electrode (30) and a reflective coating (34). A conductor element is formed as buried feedthrough (24). The buried feedthrough is provided in a portion of the insulating layer. An independent claim is included for a method for manufacturing an adaptive mirror.