| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a pattern drawing apparatus and a pattern drawing method capable of obtaining a displacement with respect to a stage of an optical head for each drawing processing even when a position of an optical head is displaced from a designed position. <P>SOLUTION: After drawing a second reference mark 62 over a first reference mark 60, which is placed on a stage and is applied with a fluorescent material 61, an excitation light corresponding to a shape of the second reference mark 62, which is generated by the first reference mark 60 and comes therefrom, is received to thereby obtain an image of the first reference mark 60 and the second reference mark 62. A relative positional relation between the first reference mark 60 and the second reference mark 62 is calculated to thereby obtain a displacement of the optical head with respect to the stage. Even when the optical head is displaced from a designed position, a predetermined pattern can be drawn while correcting the displacement by drawing the predetermined pattern while controlling the position of the drawn predetermined pattern based on the relative positional relation. <P>COPYRIGHT: (C)2013,JPO&INPIT |
