发明名称 EXPOSURE DEVICE
摘要 <P>PROBLEM TO BE SOLVED: To provide an exposure device capable of correcting flection of a base plate while controlling variation of the distance between a mask and the base plate. <P>SOLUTION: A first screw 133 and a second screw 134 drive a movable part 126B relative to a fixed part 126A in the direction parallel to a surface of a mask M (horizontal direction), which restrains the vertical displacement of the movable part 126B relative to the fixed part 126A, thereby restraining variation of the distance between the mask M and a base plate W to correct the bending of the mask M. This facilitates or does away with readjustment of a camera observing an alignment mark of the mask M or an aperture covering the pattern. <P>COPYRIGHT: (C)2013,JPO&INPIT
申请公布号 JP2012208412(A) 申请公布日期 2012.10.25
申请号 JP20110075583 申请日期 2011.03.30
申请人 NSK TECHNOLOGY CO LTD 发明人 KIRYU YASUTAKA
分类号 G03F7/20;H01L21/027 主分类号 G03F7/20
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