| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a pattern member cleaning method and a pattern member cleaning device enabling dust removal in which solid matter does not become residual on a pattern member. <P>SOLUTION: There is provided a pattern member cleaning method for removing dust attached to a pattern member, in which a pattern is formed on a substrate, and the method includes: a step of imparting a liquid dust removal material that is solidifiable by cooling to a pattern-forming surface of the pattern member; a step of cooling the liquid dust removal material to form a solid or gel dust removal layer; and a step of removing the dust removal layer together with dust attached to the pattern member. <P>COPYRIGHT: (C)2013,JPO&INPIT |
