| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a method for manufacturing a transparent gas-barrier layer, by which the transparent gas-barrier layer excellent in gas-barrier property can be efficiently produced without heating the same to a high temperature, by controlling nitriding and oxidation at a time of formation of the layer. <P>SOLUTION: In the method for manufacturing the transparent gas-barrier layer by a sputtering method, a target 17 comprising at least one carbide chosen from a metal carbide and a metalloid carbide is used, and a mixed gas comprising nitrogen gas and oxygen gas is used as a reactive gas. In the reactive gas, the mixing ratio of the oxygen gas is 1-10 vol.% based on the volume of the nitrogen gas. <P>COPYRIGHT: (C)2013,JPO&INPIT |
