发明名称 Catoptric imaging optics of optical system used in projection exposure system, has mirrors for reproducing object field in object plane into image field of image plane
摘要 <p>The catoptric imaging optics (7) has mirrors for reproducing an object field (4) in an object plane (5) into image field (8) of image plane (9). An intermediate image is formed between object field and image field. A specific mirror is designed as intermediate image of adjacent field mirror. An imaging beam path between object field and frame is located in front of field mirror. The distance between the object plane and image plane is at most three times as large as an object-image-shift. Independent claims are included for the following: (1) optical system; (2) projection exposure system; and (3) method for manufacturing micro or nano styructured component.</p>
申请公布号 DE102011088980(A1) 申请公布日期 2012.10.25
申请号 DE20111088980 申请日期 2011.12.19
申请人 CARL ZEISS SMT GMBH 发明人 SHAFER, DAVID;EPPLE, ALEXANDER;ROSTALSKI, HANS-JUERGEN
分类号 G02B17/06;G02B13/14;G03F7/20 主分类号 G02B17/06
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