| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a radiation-sensitive composition being used for pixel formation of a solid state imaging device, allowing a pixel excellent in resolution, and enabling suppression of occurrence of release defect in a pixel after post-bake carried out in pixel formation. <P>SOLUTION: A radiation-sensitive composition used for pixel formation of a solid state imaging device contains a resin, an ultraviolet absorber and a pigment, where the pigment contains at least one kind or more of each of a pigment (A) having the maximum absorption wavelength at 400 nm or more and less than 500 nm, a pigment (B) having the maximum absorption wavelength at 500 nm or more and less than 600 nm and a pigment (C) having the maximum absorption wavelength at 600 nm or more and 700 nm or less, and the total content of all the pigments is 0.1 mass% or more and 20 mass% or less relative to the total solid. <P>COPYRIGHT: (C)2013,JPO&INPIT |
