发明名称 GAS BARRIER LAMINATE, AND METHOD FOR MANUFACTURING THE SAME
摘要 <P>PROBLEM TO BE SOLVED: To provide a gas barrier laminate capable of keeping the close adhesiveness of a silicon oxide membrane to a base material consisting of polyethylene naphthalate even under a hot and humid environment, and a method for manufacturing the same. <P>SOLUTION: The gas barrier laminate has the base material consisting of polyethylene naphthalate and the silicon oxide membrane piled up on at least one surface of the base material. The polyethylene naphthalate is characterized in that the coefficient of the plane orientation by a phase difference measuring method is within a range of 0.230-0.255. The method for manufacturing the gas barrier laminate has a process for selecting a polyethylene naphthalate film, of which the coefficient of plane orientation by the phase difference measuring method is 0.230-0.255, as the base material and a process for piling up the silicon oxide membrane on at least one surface of the base material. <P>COPYRIGHT: (C)2013,JPO&INPIT
申请公布号 JP2012206306(A) 申请公布日期 2012.10.25
申请号 JP20110072147 申请日期 2011.03.29
申请人 TOPPAN PRINTING CO LTD 发明人 ISHII TOSHIYA
分类号 B32B9/00 主分类号 B32B9/00
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