CLEANING METHOD AND DEPOSITION METHOD

摘要

PROBLEM TO BE SOLVED: To provide a cleaning method that can prevent polyimide from being carbonized and remove the polyimide without leaving particles in a deposition container.

SOLUTION: There is provided the cleaning method for a deposition apparatus 10 which forms a polyimide film on a substrate carried in a deposition container 60 by supplying first material gas produced by gasifying a first raw material consisting of acid dihydride and second material gas produced by gasifying a second material consisting of diamine into the deposition container 60. While an oxygen atmosphere is generated in the deposition container 60, the deposition container 60 is heated by a heating mechanism 62 up to a temperature of 360 to 540°C to oxidize and remove the polyimide remaining in the deposition container 60.

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