| 摘要 |
The present invention relates to low pH antimicrobial solutions comprising hypochlorous acid, water, and, optionally, a buffer. The inventive low pH antimicrobial solutions have a pH from about 4 to about 6 and are useful for treating impaired or damaged tissue and for disinfecting surfaces. Chemical processes for the production of the low pH antimicrobial solutions are also provided wherein chlorine gas is added to a buffer solution containing a buffering agent and water. The present invention also provides an electrochemical process for the production of the low pH antimicrobial solutions.
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