发明名称 Treatment planning apparatus and particle therapy system
摘要 The object of the present invention is to utilize the charged particle beam with high efficiency while also reducing the treatment time in the uniform scanning or in the conformal layer stacking irradiation. In the uniform scanning, a treatment planning apparatus 104 calculates an optimum charged particle beam scan path for uniformly irradiating a collimator aperture area. In the conformal layer stacking irradiation, the treatment planning apparatus 104 calculates an optimum charged particle beam scan path for uniformly irradiating a multi-leaf collimator aperture area of each layer for each of the layers obtained by partitioning the target volume 51. Alternatively, a minimum irradiation field size that covers the multi-leaf collimator aperture area of each layer is calculated by the treatment planning apparatus 104, and a charged particle beam scan path corresponding to the irradiation field size, prestored in a memory of a particle therapy control apparatus 102, is selected. The above object is achieved by optimally changing the charged particle beam scan path in the lateral directions in conformity with the collimator aperture area in the uniform scanning or in each layer in the conformal layer stacking irradiation.
申请公布号 EP2514482(A1) 申请公布日期 2012.10.24
申请号 EP20120164455 申请日期 2012.04.17
申请人 HITACHI LTD. 发明人 FUJITAKA, SHINICHIRO;FUJII, YUSUKE;FUJIMOTO, RINTARO;HIRAMOTO, KAZUO;AKIYAMA, HIROSHI
分类号 A61N5/10 主分类号 A61N5/10
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