PHOTOMASK BLANK, AND PROCESS FOR PRODUCTION OF PHOTOMASK

摘要

According to one embodiment, a photomask blank wherein a second film (14) is stacked on a first film (13), the first film containing chromium and which is not substantially etched by the dry etching using fluorine and which is etchable by the dry etching using oxygen-containing chlorine, and the second film containing no chromium and which is etchable by dry etching using fluorine and dry etching using oxygen-containing chlorine.