| 摘要 |
The application provides a vacuum processing apparatus 10. The vacuum processing apparatus 10 includes comprising a first vacuum processing chamber 14, a second vacuum processing chamber 13, and a seal valve 100. In practice, the seal valve 100 provides a very small gas flow path 115 between the first vacuum processing chamber 14 and the second processing chamber 13 because of mechanical tolerances. The gas flow path 115 acts to neutralise plasma contained in the gas flow path 115. The gas flow path 115 preferably changes direction to increase its length and increase the opportunity for the plasma to recombine and become neutralised without causing damage within the second vacuum chamber 13. Also disclosed is a magnetic manipulator for adjusting the position of a substance in a vacuum processing chamber having a magnetic drive, a sealing device for a load lock door in a vacuum processing apparatus, and magnetic door position lock for a load lock door in a vacuum processing apparatus. |
