发明名称 RESISTIVE MEMORY AND METHODS OF PROCESSING RESISTIVE MEMORY
摘要 <p>Resistive memory and methods of processing resistive memory are described herein. One or more method embodiments of processing resistive memory include conformally forming a cell material in an opening in an interlayer dielectric such that a seam is formed in the cell material, forming a conductive pathway by modifying the seam, and forming an electrode on the cell material and the seam.</p>
申请公布号 KR20120117923(A) 申请公布日期 2012.10.24
申请号 KR20127023272 申请日期 2011.01.27
申请人 MICRON TECHNOLOGY, INC. 发明人 SANDHU GURTEJ S.;SMYTHE III JOHN A.
分类号 H01L21/8247;H01L27/115 主分类号 H01L21/8247
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