发明名称 |
Optical element, lithographic apparatus including such an optical element, device manufacturing method |
摘要 |
An optical element includes a first layer that includes a first material, and is configured to be substantially reflective for radiation of a first wavelength and substantially transparent for radiation of a second wavelength. The optical element includes a second layer that includes a second material, and is configured to be substantially absorptive or transparent for the radiation of the second wavelength. The optical element includes a third layer that includes a third material between the first layer and the second layer, and is substantially transparent for the radiation of the second wavelength and configured to reduce reflection of the radiation of the second wavelength from a top surface of the second layer facing the first layer. The first layer is located upstream in the optical path of incoming radiation with respect to the second layer in order to improve spectral purity of the radiation of the first wavelength. |
申请公布号 |
EP2515149(A1) |
申请公布日期 |
2012.10.24 |
申请号 |
EP20120155788 |
申请日期 |
2009.02.24 |
申请人 |
ASML NETHERLANDS BV |
发明人 |
SOER, WOUTER;BANINE, VADIM;MOORS, JOHANNES;VAN HERPEN, MAARTEN;YAKUNIN, ANDREI |
分类号 |
G02B5/20;B82Y10/00;G02B5/08;G02B5/22;G02B5/26;G03F7/20;G21K1/06 |
主分类号 |
G02B5/20 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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