发明名称 SUBSTRATE-BASED ADDITIVE FABRICATION PROCESS
摘要 Disclosed is a photocurable resin composition for additive fabrication comprising a polymerizable component that is polymerizable by free-radical polymerization, cat ionic polymerization, or both free-radical polymerization and cationic polymerization, and a photoinitiating system capable of initiating the free-radical polymerization, cationic polymerization, or both free-radical polymerization and cationic polymerization. The photocurable resin composition is a liquid at about 25° C., and is capable of curing to provide a solid upon irradiation with light emitted from a light emitting diode (LED), wherein the light has a wavelength of from about 100 nm to about 900 nm. Also disclosed is a three-dimensional article prepared from the photocurable resin composition for additive fabrication, and a process for preparing three-dimensional articles by additive fabrication.
申请公布号 EP2512779(A1) 申请公布日期 2012.10.24
申请号 EP20100799194 申请日期 2010.12.16
申请人 DSM IP ASSETS B.V. 发明人 XU, JIGENG;DAKE, KEN
分类号 B29C67/00 主分类号 B29C67/00
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