发明名称 |
Inspection method and apparatus, lithographic apparatus, lithographic processing cell and device manufacturing method |
摘要 |
In a scatterometric method, different targets with different sensitivities to a parameter of interest are printed in a calibration matrix and different spectra obtained. Principal component analysis is applied to the different spectra to obtain a calibration function that is less sensitive to variation in the underlying structure than a calibration function obtained from spectra obtained from a single target. |
申请公布号 |
US8294907(B2) |
申请公布日期 |
2012.10.23 |
申请号 |
US20060580265 |
申请日期 |
2006.10.13 |
申请人 |
CRAMER HUGO AUGUSTINUS JOSEPH;KIERS ANTOINE GASTON MARIE;ASML NETHERLANDS B.V. |
发明人 |
CRAMER HUGO AUGUSTINUS JOSEPH;KIERS ANTOINE GASTON MARIE |
分类号 |
G01B11/14 |
主分类号 |
G01B11/14 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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