HEATER AND SUBSTRATE PROCESSING APPARATUS HAVING THE SAME

摘要

PURPOSE: A heater and a substrate processing device including the same are provided to uniformly heat a substrate by settling a substrate on a substrate support member. CONSTITUTION: A plurality of heat source units(510) are separately arranged. A heat source unit is extended in a longitudinal direction. A plurality of substrate support members(520) are located on the upper side of a space between the heat source units. A substrate(S) is settled on the upper side of the substrate support member.