发明名称 LARGE CAPACITY DEPOSITING APPARATUS FOR FORMING THIN FILM
摘要 PURPOSE: A large capacity depositing apparatus for forming a thin film is provided to stably maintain an amount of a vaporized raw material by controlling the amount of the raw material vaporized from a raw material container. CONSTITUTION: A vaporization chamber(120) is combined with an upper portion of a raw material container to be communicated with the raw material container. A jet orifice(130) injects a vaporized raw material passing through the vaporization chamber to the upper portion. A first heater supplies heat to the raw material container to vaporize to the raw material stored in the raw material container. A sensor(150) is installed in the vaporization chamber and senses the amount of the vaporized raw material passing through the vaporization chamber. A control part(160) controls the amount of the raw material vaporized from the raw material container by getting an amount of feed backs of the vaporized raw material from the sensor to the vaporization chamber.
申请公布号 KR20120116719(A) 申请公布日期 2012.10.23
申请号 KR20110034340 申请日期 2011.04.13
申请人 SNU PRECISION CO., LTD. 发明人 SONG, KI CHUL;CHO, WHANG SIN;JUNG, SEUNG CHUL;AHN, WOO JUNG
分类号 H01L51/56;C23C14/24 主分类号 H01L51/56
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