发明名称 Multilayer pillar for reduced stress interconnect and method of making same
摘要 A multi-layer pillar and method of fabricating the same is provided. The multi-layer pillar is used as an interconnect between a chip and substrate. The pillar has at least one low strength, high ductility deformation region configured to absorb force imposed during chip assembly and thermal excursions.
申请公布号 US8293587(B2) 申请公布日期 2012.10.23
申请号 US20070870583 申请日期 2007.10.11
申请人 JADHAV VIRENDRA R;SEMKOW KRYSTYNA W;SRIVASTAVA KAMALESH K;SUNDLOF BRIAN R;INTERNATIONAL BUSINESS MACHINES CORPORATION 发明人 JADHAV VIRENDRA R;SEMKOW KRYSTYNA W;SRIVASTAVA KAMALESH K;SUNDLOF BRIAN R
分类号 H01L21/00 主分类号 H01L21/00
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