发明名称 Integrated circuit device and method for its production
摘要 An integrated circuit device includes a semiconductor body fitted with a first electrode and a second electrode on opposite surfaces. A control electrode on an insulating layer controls channel regions of body zones for a current flow between the two electrodes. A drift section adjoining the channel regions comprises drift zones and charge compensation zones. A part of the charge compensation zones includes conductively connected charge compensation zones electrically connected to the first electrode. Another part includes nearly-floating charge compensation zones, so that an increased control electrode surface has a monolithically integrated additional capacitance CZGD in a cell region of the semiconductor device.
申请公布号 US8294206(B2) 申请公布日期 2012.10.23
申请号 US201113161130 申请日期 2011.06.15
申请人 WILLMEROTH ARMIN;KAINDL WINFRIED;TOLKSDORF CAROLIN;RUEB MICHAEL;INFINEON TECHNOLOGIES AUSTRIA AG 发明人 WILLMEROTH ARMIN;KAINDL WINFRIED;TOLKSDORF CAROLIN;RUEB MICHAEL
分类号 H01L29/66 主分类号 H01L29/66
代理机构 代理人
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