发明名称 |
Method for production of substrate electrode for plasma processing |
摘要 |
A plurality of reference holes are formed in the surface of a first substrate made of a first material, and a plurality of columnar members are each fitted in the reference holes in such a manner that at least a part of each of the columnar members projects from the surface of the first substrate. Subsequently, an electrode surface layer made of a second material is formed on the surface of the first substrate in such a manner that an end portion of each of the columnar members are exposed at the surface and then the columnar members are removed. Thus obtained is a substrate-like electrode including at least an electrode surface layer provided with through holes having a cross section matching a sectional shape of the projecting portion of the columnar members. |
申请公布号 |
US8291581(B2) |
申请公布日期 |
2012.10.23 |
申请号 |
US20080602559 |
申请日期 |
2008.05.30 |
申请人 |
KAWAHARA FIMITOMO;MITSUI ENGINEERING & SHIPBUILDING CO., LTD.;ADMAP, INC. |
发明人 |
KAWAHARA FIMITOMO |
分类号 |
H01R43/00 |
主分类号 |
H01R43/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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