发明名称 Method for production of substrate electrode for plasma processing
摘要 A plurality of reference holes are formed in the surface of a first substrate made of a first material, and a plurality of columnar members are each fitted in the reference holes in such a manner that at least a part of each of the columnar members projects from the surface of the first substrate. Subsequently, an electrode surface layer made of a second material is formed on the surface of the first substrate in such a manner that an end portion of each of the columnar members are exposed at the surface and then the columnar members are removed. Thus obtained is a substrate-like electrode including at least an electrode surface layer provided with through holes having a cross section matching a sectional shape of the projecting portion of the columnar members.
申请公布号 US8291581(B2) 申请公布日期 2012.10.23
申请号 US20080602559 申请日期 2008.05.30
申请人 KAWAHARA FIMITOMO;MITSUI ENGINEERING & SHIPBUILDING CO., LTD.;ADMAP, INC. 发明人 KAWAHARA FIMITOMO
分类号 H01R43/00 主分类号 H01R43/00
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