| 摘要 |
<P>PROBLEM TO BE SOLVED: To restrain dispersion of processing liquid in a substrate processing device. <P>SOLUTION: In a substrate processing device, by emitting processing liquid from a nozzle 34 toward a top face of a rotating substrate 9, the substrate 9 is cleaned. In the substrate processing device, a horizontal component in a contact direction of the processing liquid at a position, where the processing liquid emitted from the nozzle 34 comes into contact with the substrate 9, is directed to a tangential direction of rotation of the substrate 9 at a contact position, or is inclined outward in a radial direction from the tangential direction. This restrains movement of the processing liquid on the substrate 9 together with the rotation of the substrate 9 from being blocked by the processing liquid emitted from the nozzle 34. As a result, a force of collision of the processing liquid moving on the substrate 9 and the processing liquid emitted from the nozzle 34 can be reduced to restrain dispersion of the processing liquid upward from the substrate 9. <P>COPYRIGHT: (C)2013,JPO&INPIT |
