| 发明名称 |
APPARATUS AND METHOD FOR TRANSPORTING WAFER |
| 摘要 |
<p>PURPOSE: An apparatus and method for transferring a wafer are provided to easily eliminate a washing solution remaining on the wafer by including an injection part injecting gas on a robot chuck. CONSTITUTION: A robot chuck grips a wafer. The robot chuck moves with the wafer. An injection part is formed in the robot chuck. The injection part injects gas on the wafer. A first robot arm(130) and a second robot arm(140) grip the wafer.</p> |
| 申请公布号 |
KR20120116163(A) |
申请公布日期 |
2012.10.22 |
| 申请号 |
KR20110033749 |
申请日期 |
2011.04.12 |
| 申请人 |
LG SILTRON INCORPORATED |
发明人 |
SEO, YOON KYO;CHO, HEE DON;JEONG, EUN DO |
| 分类号 |
H01L21/677;B25J15/08;H01L21/304 |
主分类号 |
H01L21/677 |
| 代理机构 |
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代理人 |
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| 主权项 |
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| 地址 |
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