| 发明名称 |
MAINTENANCE METHOD, MAINTENANCE APPARATUS, EXPOSURE DEVICE, MANUFACTURING METHOD AND PROGRAM OF DEVICE, AND RECORDING MEDIUM |
| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a maintenance method capable of suppressing occurrence of exposure failure. <P>SOLUTION: In a liquid immersion exposure device that exposes a substrate with exposure light through an exposure liquid, the maintenance method of a liquid immersion member placed at least partially on the periphery of the optical path of exposure light passing through the exposure liquid between an optical member and the substrate includes a step for supplying a maintenance gas to the liquid immersion member. <P>COPYRIGHT: (C)2013,JPO&INPIT |
| 申请公布号 |
JP2012204832(A) |
申请公布日期 |
2012.10.22 |
| 申请号 |
JP20120053666 |
申请日期 |
2012.03.09 |
| 申请人 |
NIKON CORP |
发明人 |
SHIRAISHI KENICHI;ISHII YUUKI;KIKUCHI HIDEKAZU |
| 分类号 |
H01L21/027;G03F7/20 |
主分类号 |
H01L21/027 |
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