| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a film deposition apparatus capable of depositing a multilayered film, wherein the size of the entire apparatus can be reduced. <P>SOLUTION: The film deposition apparatus is structured to deposit a film onto an inner surface of a substrate to be treated while winding the substrate around a film deposition treatment drum at a prescribed angle and continuously or intermittently transferring the substrate, so that the size of the entire apparatus is reduced. The multilayered film can be readily deposited by rotating a rotary drum equipped with a film deposition source in the deposition treatment drum. <P>COPYRIGHT: (C)2013,JPO&INPIT |
