| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a foreign matter removing method and a foreign matter removing device for a photomask, which are capable of accurately removing foreign matters entering a minute concave portion of a pattern. <P>SOLUTION: A cantilever 12 is displaced vertically to scan a surface of a substrate 01 while controlling a triaxial fine motion mechanism 21 so as to make an amount of displacement of the cantilever 12 constant, whereby three-dimensional information of the surface of the substrate 01 and foreign matters 02 is acquired. After an approach position and an amount of approach in a depth direction of a probe 11 are determined on the basis of three-dimensional information on the surface of the substrate 01 and foreign matters 02, the probe 11 is made to approach the foreign matters 02 in accordance with the determined values. The moment that the probe 11 (capillary 14) comes into contact with the foreign matters 02, the foreign matters 02 are sucked to the capillary 14. The probe 11 is pulled up together with the cantilever 12 with the foreign matters 02 sucked in the capillary 14, whereby the foreign matters 02 entering a concave portion of the substrate 01 are removed. <P>COPYRIGHT: (C)2013,JPO&INPIT |
