发明名称 POSITION DETECTION METHOD, PATTERN DRAWING METHOD, PATTERN DRAWING APPARATUS, AND COMPUTER PROGRAM
摘要 <P>PROBLEM TO BE SOLVED: To shorten a detection time while maintaining a position detection accuracy of a plurality of reference marks formed on an object. <P>SOLUTION: An evaluation value is acquired by taking each of reference marks to be measured as an objective mark. Based on the evaluation values, a probability that interpolation position information of the reference mark agrees with actually measured position information is evaluated. In the case where "optimum evaluation value&le;threshold value" is satisfied, in other words, the position information of one reference mark can be interpolated with high probability based on the position information of the other reference mark, one reference mark is excluded from the reference mark to be actually measured. Consequently, for the second substrate or later, the number of reference marks to be actually measured can be decreased while maintaining a high detection precision, resulting in improved throughput. <P>COPYRIGHT: (C)2013,JPO&INPIT
申请公布号 JP2012204422(A) 申请公布日期 2012.10.22
申请号 JP20110065225 申请日期 2011.03.24
申请人 DAINIPPON SCREEN MFG CO LTD 发明人 KITAMURA KIYOSHI;NAKAI KAZUHIRO
分类号 H01L21/027;G03F7/20 主分类号 H01L21/027
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