发明名称 COMPOSITION FOR FORMING LOW-REFRACTIVE INDEX FILM, METHOD FOR MANUFACTURING LOW-REFRACTIVE INDEX THIN FILM, AND COMPONENT WITH ANTI-REFLECTION FILM
摘要 <P>PROBLEM TO BE SOLVED: To provide a composition for forming a low-refractive index film, which has a low refractive index when provided on a base, has sufficient mechanical strength, can be hardened in a short time at a low temperature, and has improved light transmissivity, and to provide an optical component and a solar cell member using the same. <P>SOLUTION: The composition for forming a low-refractive index film includes a silicone resin obtained by selecting two or more kinds of silane compounds expressed by general formula (1) R<SP POS="POST">1</SP><SB POS="POST">n</SB>SiX<SB POS="POST">(4-n)</SB>, as raw materials and hydrolyzing and condensing a mixture of the raw materials. In the formula (1), R<SP POS="POST">1</SP>represents an alkyl group with 1 to 20 carbon atoms which may be substituted with an F atom, a phenyl group, a hydrogen atom, or a vinyl group, and X represents a hydrolyzable group like an alkoxy group, a phenoxy group, a halogen atom, an acetoxy group, an isocyanate group, or a hydroxyl group. n represents an integer of 0 to 2, and R<SP POS="POST">1</SP>in the silane compounds may be equal or different in the case of n being 2, and hydrolyzable groups represented by X in the silane compounds may be equal or different in the case of n being 0 to 2. <P>COPYRIGHT: (C)2013,JPO&INPIT
申请公布号 JP2012203059(A) 申请公布日期 2012.10.22
申请号 JP20110065198 申请日期 2011.03.24
申请人 TOSOH F-TECH INC 发明人 FUJITA HIROAKI
分类号 G02B1/11;C08G77/04;C08G77/24;G02B1/04 主分类号 G02B1/11
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