| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a lithography apparatus that is advantageous from the viewpoint of uniformity in characteristic among plural charged particle beams even when the apparatus has an irradiation optical system having a nonuniform irradiation angle. <P>SOLUTION: A lithography apparatus has: an irradiation optical system (140) containing a collimator lens; an aperture array (117) for dividing a charged particle beam emitted from the irradiation optical system into plural charged particle beams; a converging lens array (119) for forming plural crossovers from the plural charged particle beams emitted from the aperture array; and a projection system (160) containing an element (122) having plural apertures corresponding to the plural crossovers, and plural projection units for projecting the charged particle beams onto a substrate. The converging lens array contains a converging lens array which is eccentric to corresponding apertures in the element so that the respective positions of the plural crossovers formed by the converging lens array upon incidence to the aperture array at an incident angle based on the aberration of the irradiation optical system are matched with the corresponding apertures in the element. <P>COPYRIGHT: (C)2013,JPO&INPIT |
