发明名称 SOLID STATE IMAGING DEVICE AND MANUFACTURING METHOD OF THE SAME
摘要 <P>PROBLEM TO BE SOLVED: To provide a solid state imaging device which has a partition layer provided for preventing cross talk, inhibits deterioration in sensitivity characteristics and achieves an excellent picture quality even when a size of a light-receiving part is downsized for higher picture quality. <P>SOLUTION: A solid state imaging device comprises: a semiconductor substrate 11; a plurality of light-receiving parts 12 arranged in a matrix shape in the semiconductor substrate 11 for performing photoelectric conversion; a partition layer 20 arranged above the semiconductor substrate 11 and having openings at regions corresponding to upsides of the light-receiving parts 12, respectively, for partitioning the upsides of the light-receiving parts 12 by the opening and a region between the openings with respect to each light-receiving part 12; and a color filter layer 24 arranged in the opening. The partition layer 20 includes a partition body layer 21, an adhesion layer 22 and a metal layer 23 laminated on the partition body layer 21. The metal layer 23 arranged on top is composed of metal. <P>COPYRIGHT: (C)2013,JPO&INPIT
申请公布号 JP2012204387(A) 申请公布日期 2012.10.22
申请号 JP20110064750 申请日期 2011.03.23
申请人 PANASONIC CORP 发明人 ONAKA KEIJI
分类号 H01L27/14;H01L27/146 主分类号 H01L27/14
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