| 摘要 |
<P>PROBLEM TO BE SOLVED: To effectively utilize radiation light radiated through a window member 12 while using a light source lamp 11 and the window member 12 which are small as much as possible with respect to a dimension of a workpiece W. <P>SOLUTION: In an optical processing apparatus according to the present invention, the workpiece W having a substantially rectangular pattern formation part is irradiated with radiation light radiated from a light irradiation unit 20. The light irradiation unit 20 includes: a casing 10; the ultraviolet radiation lamp 11 arranged at an inside of the casing 10; and the rectangular light transmissive window member 12 provided on one face of the casing 10. One side of the light transmissive window member 12 and one side of the pattern formation part are not in parallel with each other. <P>COPYRIGHT: (C)2013,JPO&INPIT |
