| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a method, a device, and a chemical substance for minimizing the effects of undesirable chemical changes to a resist when removing an ion implanted resist. <P>SOLUTION: The method is a method to remove at least one of carbonized materials and organic materials from a semiconductor structure, in which the semiconductor structure is contacted with a superacid composition containing a superacid species. <P>COPYRIGHT: (C)2013,JPO&INPIT |
