| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a resin removal method capable of removing resin from the pattern surface of a mold efficiently without causing any damage on the mold. <P>SOLUTION: In an ashing gas atmosphere for removing resin adhering to an original pattern used for imprint, the original pattern is irradiated with ultraviolet light and near-field light is generated in the local region of protrusions and recesses on the original pattern. The resin is removed from the original pattern by using the ashing gas and the near-field light. <P>COPYRIGHT: (C)2013,JPO&INPIT |
