发明名称 PLASMA CLEANING APPARATUS
摘要 <P>PROBLEM TO BE SOLVED: To provide a plasma cleaning apparatus that achieves plasma cleaning without damaging an LED element mounted on a lead frame. <P>SOLUTION: In a state that a plurality of lead frames 3 are stored in respective storage grooves 13 of three storage blocks 10 in a storage device and opening/closing doors are closed, the plasma cleaning device 1 supplies plasma reactive gas into a chamber 1A held in a vacuum state, and applies a high frequency to one of a pair of electrodes by a high-frequency power source to turn the reactive gas to plasma and the lead frames 2 is cleaned. At this time, the respective lead frames 3 stored in the respective storage grooves 13 of the storage device 2 are drawn downward with magnetic force of respective magnets 14 to stand upright, so the respective lead frames 3 are made not to tilt to have their upper-end parts closer or farther to the contrary. <P>COPYRIGHT: (C)2013,JPO&INPIT
申请公布号 JP2012200685(A) 申请公布日期 2012.10.22
申请号 JP20110068666 申请日期 2011.03.25
申请人 HITACHI HIGH-TECH INSTRUMENTS CO LTD 发明人 FUKUDA MASAYUKI
分类号 B08B7/00;H01L21/3065;H01L23/50 主分类号 B08B7/00
代理机构 代理人
主权项
地址