| 摘要 |
<p>PURPOSE: A substrate for a photo-mask, the photo-mask, and a pattern transferring method are provided to prevent the misalignment of coordinate in the process of transferring patterns. CONSTITUTION: Transferring patterns are formed on the first main surface of a substrate for a photo-mask. A holding region(104) is out of a region with transferring patterns and includes a contact side around two sides to which the first main surface faces. A holding member is contacted to the contact side of the holding region when an exposure device holds the photo-mask. Flatness indexes with respect to the difference of elevation of two points in or out of the holding region satisfy a pre-determined inequality. [Reference numerals] (501) Light source; (502) Light illuminating system</p> |
