发明名称 ELECTRON SOURCE FOR GENERATING AN ELECTRON BEAM AND X-RAY SOURCE FOR GENRATING X-RAY RADIATION
摘要 The invention relates to an electron source (1) for generating an electron beam (23), a first electron emitter (20) for generating electrons and at least one second electron emitter (21) for generating electrons being arranged in said electron source, wherein the first electron emitter (20) and the at least one second electron emitter (21) are designed such that they can be operated alternatively and are arranged in a stationary fashion with respect to one another. In addition, at least one common device for focusing the electrons of the first electron emitter (20) and of the at least one second electron emitter (21) is provided in the electron source (1), wherein the formed electron beam (22) of the first electron emitter (20) and the formed electron beam (22) of the at least one second electron emitter (21) can be directed onto a common focusing surface (23) by the at least one device for focusing the electrons. Furthermore, the invention relates to an X-ray source (100), wherein the X-ray source (100) comprises an electron source (1) and an anode (24), wherein the electron source (1) is designed in this way.
申请公布号 WO2012139872(A2) 申请公布日期 2012.10.18
申请号 WO2012EP55205 申请日期 2012.03.23
申请人 SIEMENS AKTIENGESELLSCHAFT;SCHULZ, REINER FRANZ 发明人 SCHULZ, REINER FRANZ
分类号 H01J35/06;H01J3/06;H05G1/70 主分类号 H01J35/06
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