MULTI-FREQUENCY HOLLOW CATHODE AND SYSTEMS IMPLEMENTING THE SAME
摘要
A hollow cathode system is provided for plasma generation in substrate plasma processing. The system includes an electrically conductive member shaped to circumscribe an interior cavity, and formed to have a process gas inlet in fluid communication with the interior cavity, and formed to have an opening that exposes the interior cavity to a substrate processing region. The system also includes a first radiofrequency (RF) power source in electrical communication with the electrically conductive member so as to enable transmission of a first RF power to the electrically conductive member. The system further includes a second RF power source in electrical communication with the electrically conductive member so as to enable transmission of a second RF power to the electrically conductive member. The first and second RF power sources are independently controllable with regard to frequency and amplitude.
申请公布号
WO2012141862(A1)
申请公布日期
2012.10.18
申请号
WO2012US30069
申请日期
2012.03.22
申请人
LAM RESEARCH CORPORATION;HOLLAND, JOHN, PATRICK;VENTZEK, PETER, L. G.