| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a substrate on which a spin etching or the like can be reliably performed, and further to provide a manufacturing method of an electro-optical device used the substrate. <P>SOLUTION: An electro-optical device substrate 10s is provided with a first chamfer 10e and a first circular arc surface 10f at a first substrate surface 10t side and has a second chamfer 10i and a second circular arc surface 10h at a second substrate surface 10u side. A radius of curvature Ra of the first circular arc surface 10f is greater than a radius of curvature Rb of the second circular arc surface 10h. A first chamfer angle θa formed by the first substrate surface 10t and the first chamfer 10e is greater than a second chamfer angle θb formed by the second substrate surface 10u and the second chamfer 10i. A sum da of a width dimension of the first chamfer 10e as viewed in a plan view and a width dimension of the first circular arc surface 10f as viewed in the plan view is greater than a sum db of a width dimension of the second chamfer 10i as viewed in the plan view and a width dimension of the second circular arc surface 10h as viewed in the plan view. <P>COPYRIGHT: (C)2013,JPO&INPIT |
