发明名称 |
SILICON SUBSTRATES WITH DOPED SURFACE CONTACTS FORMED FROM DOPED SILICON INKS AND CORRESPONDING PROCESSES |
摘要 |
The use of doped silicon nanoparticle inks and other liquid dopant sources can provide suitable dopant sources for driving dopant elements into a crystalline silicon substrate using a thermal process if a suitable cap is provided. Suitable caps include, for example, a capping slab, a cover that may or may not rest on the surface of the substrate and a cover layer. Desirable dopant profiled can be achieved. The doped nanoparticles can be delivered using a silicon ink. The residual silicon ink can be removed after the dopant drive-in or at least partially densified into a silicon material that is incorporated into the product device. The silicon doping is suitable for the introduction of dopants into crystalline silicon for the formation of solar cells. |
申请公布号 |
WO2012106137(A3) |
申请公布日期 |
2012.10.18 |
申请号 |
WO2012US22215 |
申请日期 |
2012.01.23 |
申请人 |
NANOGRAM CORPORATION;LIU, GUOJUN;SRINIVASAN, UMA;CHIRUVOLU, SHIVKUMAR |
发明人 |
LIU, GUOJUN;SRINIVASAN, UMA;CHIRUVOLU, SHIVKUMAR |
分类号 |
H01L31/042;H01L31/0216;H01L31/18 |
主分类号 |
H01L31/042 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|