摘要 |
The invention relates to a method for manufacturing a thin film solar cell, comprising the sequential steps of a) depositing a positively doped Si layer (3), b1) depositing a first intrinsic a-Si:H layer (21) at a first deposition rate, b2) depositing a second intrinsic a-Si:H layer (22) at a second deposition rate, and c) depositing a negatively doped Si layer (5), whereby the second deposition rate is greater than the first deposition rate. The thin film solar cell manufactured is characterized by an increased initial and stabilized efficiency while at the same time the overall deposition rate, even by depositing two different intrinsic layers (21, 22), is kept at a reasonable and economic level. |
申请人 |
OERLIKON SOLAR AG, TRUEBBACH;FECIORU-MORARIU, MARIAN;MEREU, BOGDAN |
发明人 |
FECIORU-MORARIU, MARIAN;MEREU, BOGDAN |