| 摘要 |
<P>PROBLEM TO BE SOLVED: To form a high-quality film, while achieving the reduction of a film formation cost, by reducing the frequency of the maintenance of a film-forming device and also improving the utilization efficiency of a film formation material. <P>SOLUTION: The film-forming device 100 forms a film by depositing the microparticulated film formation material 160 on a substrate 200. The film-forming device includes: a housing 150; an atomization mechanism that sprays a film formation gas, obtained by microparticulating the film formation material 160, in the housing 150; and an electric field formation mechanism that generates an electric field near a prescribed part so that the film formation material 160 does not adhere to the prescribed part of a wall surface of the housing 150. <P>COPYRIGHT: (C)2013,JPO&INPIT |
