发明名称 |
LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD |
摘要 |
In a lithographic apparatus, an illumination mode is set using a field mirror that includes a plurality of movable facets to direct radiation to selectable positions on a pupil facet mirror. A base illumination mode is selected from a set of predetermined illumination modes and the movable facets are set to effect that mode. In order to adjust an imaging parameter, a fraction of the movable facets are set to different positions. The determination of which facets to set to different positions is based on summing the effects of setting each facet to a different position. |
申请公布号 |
US2012262689(A1) |
申请公布日期 |
2012.10.18 |
申请号 |
US201013517480 |
申请日期 |
2010.11.19 |
申请人 |
VAN INGEN SCHENAU KOEN;VAN SCHOOT JAN BERNARD PLECHELMUS;DE VRIES GOSSE CHARLES;ASML NETHERLANDS B.V. |
发明人 |
VAN INGEN SCHENAU KOEN;VAN SCHOOT JAN BERNARD PLECHELMUS;DE VRIES GOSSE CHARLES |
分类号 |
G03B27/54 |
主分类号 |
G03B27/54 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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