发明名称 |
RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, AND POLYMERIC COMPOUND |
摘要 |
A resist composition including a base component (A) which exhibits changed solubility in a developing solution under the action of acid and an acid-generator component (B) which generates acid upon exposure, the base component (A) containing a resin component (A1) including a structural unit (a0) represented by general formula (a0-1) shown below and a structural unit derived from an acrylate ester which may have the hydrogen atom bonded to the carbon atom on theα-position substituted with a substituent and contains an acid decomposable group which exhibits increased polarity by the action of acid (wherein R represents a hydrogen atom, an alkyl group of 1 to 5 carbon atoms or a halogenated alkyl group of 1 to 5 carbon atoms).
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申请公布号 |
US2012264052(A1) |
申请公布日期 |
2012.10.18 |
申请号 |
US201213441200 |
申请日期 |
2012.04.06 |
申请人 |
IRIE MAKIKO;HIRANO TOMOYUKI;TAKAKI DAICHI;TOKYO OHKA KOGYO CO., LTD |
发明人 |
IRIE MAKIKO;HIRANO TOMOYUKI;TAKAKI DAICHI |
分类号 |
G03F7/20;C08F224/00;C08F228/06;G03F7/004 |
主分类号 |
G03F7/20 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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