发明名称 METHOD OF FORMING A CAPACITOR AND METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE USING THE SAME
摘要 A capacitor is fabricated by forming a mold layer of a silicon based material that is not an oxide of silicon, e.g., polysilicon or doped polysilicon, on a substrate, forming an opening through the mold layer, forming a barrier layer pattern along the sides of the opening, subsequently forming a lower electrode in the opening, then removing the mold layer and the barrier layer pattern, and finally sequentially forming dielectric layer and an upper electrode on the lower electrode.
申请公布号 US2012264271(A1) 申请公布日期 2012.10.18
申请号 US201213438151 申请日期 2012.04.03
申请人 KUH BONG JIN;LEE JONG-CHEOL;TAK YONG-SUK;YOU YOUNG-SUB;CHO KYU-HO;LIM JONG-SUNG;SAMSUNG ELECTRONICS CO., LTD. 发明人 KUH BONG JIN;LEE JONG-CHEOL;TAK YONG-SUK;YOU YOUNG-SUB;CHO KYU-HO;LIM JONG-SUNG
分类号 H01L21/02 主分类号 H01L21/02
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