GATE VALVE DEVICE, DEVICE FOR PROCESSING SUBSTRATE, AND METHOD FOR PROCESSING THE SUBSTRATE

摘要

PROBLEM TO BE SOLVED: To prevent air penetration into a chamber in which a high degree of vacuum is expected to maintain even when a sealing member is heated by heat from a hot wall chamber and to maintain vacuum pressure in the chamber.

SOLUTION: A gate valve device is provided between a process chamber 200B which is a hot wall chamber and a transfer chamber 300 in which a higher degree of vacuum is expected to maintain than in the process chamber 200B. A double sealing structure is provided between the side wall of the transfer chamber and the side wall of the housing by surrounding a substrate carry-in/out port into and from the transfer chamber with a first sealing member 330A and a second sealing member 330B outside thereof. In the gap between the sealing members, at least one communication hole 408 in communication with the internal space of the housing is provided in the side wall of the housing, and the substrate carry-in/out port into and from the transfer chamber is opened and closed with a valve element 410 which is ascendible and descendible within the housing.

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