发明名称 Method of Fabricating Thin Film Transistor Substrate of Poly-type
摘要 A method of fabricating a liquid crystal display device according to an embodiment of the present invention includes forming first and second conductive layers on a substrate, wherein the first layer is transparent; patterning the second conductive layer and the first conductive layer using the photo-resist pattern as a mask; etching at least one lateral part of the patterned second conductive layer using the photo-resist pattern as a mask; and removing the remaining photo-resist pattern.
申请公布号 KR101192746(B1) 申请公布日期 2012.10.18
申请号 KR20040092683 申请日期 2004.11.12
申请人 发明人
分类号 G02F1/136 主分类号 G02F1/136
代理机构 代理人
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